The diffusion of Hf in the α-phase was studied, at 823 to 1023K, by applying Rutherford back-scattering spectrometry to 15nm-thick films which had been deposited onto α-Ti samples. The results showed that the diffusion coefficients (table 277) exhibited a non-regular Arrhenius behavior. The latter, which was also seen in α-Zr, was explained in terms of intrinsic and extrinsic diffusion mechanisms.
M.Behar, F.Dyment, R.A.Perez, H.R.Dos Santos, R.L.Maltez, E.J.Savino: Philosophical Magazine A, 1991, 63[5], 967-72
Table 277
Diffusivity of Hf in α-Ti
Temperature (K) | D (m2/s) |
823 | 1.2 x 10-22 |
873 | 1.7 x 10-21 |
923 | 1.5 x 10-20 |
973 | 1.1 x 10-19 |
1023 | 3.2 x 10-19 |