The interdiffusion process in thin and thick (500nm to 60µm) Au–Ni layers deposited on different substrates was studied using the EDS technique. In-depth X-ray analysis based on the Pouchou and Pichoir method was applied for obtaining the concentration profiles in nanometre scale multi-layers. A theoretical analysis using the Darken method was employed for modelling interdiffusion in the Au–Ni system. Computer simulations, where intrinsic diffusivities of the Au and Ni were functions of composition, were presented and compared with experimental results.

EDS X-Ray Investigation of Interdiffusion in Au–Ni Micro- and Nanolayers. A.Rakowska, R.Filipek, K.Sikorski, M.Danielewski, R.Bachorczyk: Microchimica Acta, 2004, 145[1-4], 183-6