The interdiffusion of Rh and Ta was studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at 800 to 900C and from 1000 to 1075C. The diffusion profiles were obtained by Rutherford back-scattering. They suggested the formation of 2 clearly different phases in each temperature range considered.

Interdiffusion Study of Rhodium and Tantalum by RBS. V.E.Nuttens, R.L.Hubert, F.Bodart, S.Lucas: Nuclear Instruments and Methods in Physics Research B, 2005, 240[1-2], 425-8