Optically-induced dissolution and diffusion of Ag into thin films of amorphous vacuum evaporated films with composition As33S67 was studied. Rutherford back-scattering spectroscopy, as a non-destructive method for depth profiles measurements, was used for in situ measurements of the optically-induced dissolution and diffusion process. A bilayer of Ag/As33S67 deposited on quartz substrate was placed into Rutherford back-scattering spectroscopy measuring chamber and step-by-step illuminated by the second harmonic green light from solid-state Nd-doped laser with beam diameter of 5mm, a wavelength of 532nm and a power output of 21mW. The Ag-diffusion depth profile development was resolved using GISA 3 code. The Ag diffusion profiles could be described by an error function. Their behaviour was typical for diffusion process from limited source influenced by chemical reaction of Ag on the boundary between doped and undoped film.

RBS in situ Studies of the Kinetics of Optically-Induced Diffusion of Ag in Vacuum-Evaporated Films with the Composition As33S67. V.Peřina, T.Wágner, M.Krbal, M.Frumar: Nuclear Instruments and Methods in Physics Research B, 2006, 249[1-2], 352-4