An investigation was made of the nature of Si on iron interface in electron beam deposited Fe/Si bilayers, with various iron and Si thicknesses. The Fe and Si layer thicknesses were varied from 30 to 330Å and 20 to 86Å, respectively. Grazing incidence X-ray reflectivity and photoelectron spectroscopy measurements were carried out on these samples to determine interface characteristics. The Si-on-Fe interlayer thickness, roughness, and composition do not depend on the thickness of Fe and Si. The thickness of the interlayer was around 13Å. A systematic variation in silicide concentration across this interface was observed by X-ray photoelectron spectroscopy measurement. Change in the density of states in valence band across this interface was also observed by ultraviolet photoelectron measurement.

X-Ray Reflectivity and Photo-Electron Spectroscopy Study of Interdiffusion at the Si/Fe Interface. S.R.Naik, S.Rai, G.S.Lodha, R.Brajpuriya: Journal of Applied Physics, 2006, 100[1], 013514 (6pp)