Kinetic processes taking place on the surface, and influencing the depth-distribution of components during deposition of multi-layers, were studied using a kinetic model. The depth distribution of components in a growing structure, broadening of interfaces between layers and the shape of concentration peaks of multi-layers were analyzed with respect to the evolution of surface roughness during deposition. The roughness depended upon the adsorption rate and upon surface diffusion. In this model, surface diffusion was sub-divided into up-diffusion and down-diffusion. It was shown that the atomic fluxes of up-diffusion and down-diffusion did not compensate each other, even in the case of equal diffusion coefficients, since they depended upon the coverage of different monolayers. Down-diffusion resulted in a smoother surface. Up-diffusion made it rougher.It was quantitatively shown by kinetic modeling that with increase of down-diffusion the amplitude of concentration peaks of components increased, the broadening of interface between layers decreased and concentration peaks became asymmetrical. The asymmetry of concentration peaks was found even in the case of equal diffusion coefficients of different components. At different diffusivity of components, the asymmetry was following: the concentration peaks of heavy-component (less diffusivity) showed enhanced trailing tails on the back profile side (for light-component on the contrary). Up-diffusion resulted in increase of surface roughness and broadening of interface between layers. The quantitative functions of surface roughness on ratio of up- and down- diffusion coefficients were calculated and analyzed.

The Influence of Surface Diffusion on Surface Roughness and Component Distribution Profiles during Deposition of Multilayers. A.Galdikas: Computational Materials Science, 2007, 38[4], 716-21