The morphology, structure and thermal behavior of magnetron-sputtered TiN thin films with thicknesses ranging from 100 to 2900nm were characterized. The films were thermally cycled and the relationship between film thickness, defect density and intrinsic stress relaxation was analyzed. The results indicated that the residual stresses in the as-deposited films and the amount of stress relaxation depended decisively on the specific depth gradient of point defects originating from film evolution during growth. The compressive stresses, which represented various driving forces and the amount of stress relaxation, decreased while the onset temperature for stress relaxation increased with increasing film thickness.

Annealing of Intrinsic Stresses in Sputtered TiN Films - the Role of Thickness-Dependent Gradients of Point Defect Density. H.Köstenbauer, G.A.Fontalvo, M.Kapp, J.Keckes, C.Mitterer: Surface and Coatings Technology, 2007, 201[8], 4777-80