Thin films were deposited onto Si, SrTiO3 and MgO substrates by ion-beam sputtering, and the effects of ion implantation were studied as a function of the initial microstructures of the thin films. Various microstructures of as-deposited and implanted samples were characterized by means of X ray diffraction, high-resolution transmission electron microscopy and electron energy loss spectroscopy, and were compared with the cubic and monoclinic phases of Y2O3. The results clearly revealed the presence of non-equilibrium phases in implanted and non-implanted thin films. Particular attention was paid to understanding the relationship between the organization of the O-vacancy network, and the stoichiometry and formation mechanisms of the crystallographic phases.

Yttrium Oxide Thin Films - Influence of the Oxygen Vacancy Network Organization on the Microstructure. M.Jublot, F.Paumier, F.Pailloux, B.Lacroix, E.Leau, P.Guérin, M.Marteau, M.Jaouen, R.J.Gaboriaud, D.Imhoff: Thin Solid Films, 2007, 515[16], 6385-90