Reactions of common network-bound halogens (SiCl, SiF) in synthetic SiO2 glass, with interstitial O2 and H2O molecules incorporated by thermally annealing, were studied. It was found that the chemical properties were distinctly different for SiCl and SiF groups. The SiCl groups reacted with interstitial O2 and H2O to form interstitial Cl2 and HCl, respectively. On the other hand, the formation of interstitial F2 and HF due to the reaction of SiF groups with interstitial O2 and H2O was not observed. The reactivity of SiCl and SiF groups was in accord with the properties and thermodynamic data on their respective analogous compounds, SiCl4 and SiF4.

Reactivity of SiCl and SiF Groups in SiO2 Glass with Mobile Interstitial O2 and H2O Molecules. K.Kajihara, M.Hirano, L.Skuja, H.Hosono: Journal of Non-Crystalline Solids, 2007, 353[5-7], 514-7