Thin films (0.2 to 2) of mixed oxides were prepared by radio-frequency magnetron sputtering. It was found that the stability, texture and composition of the deposits depended sensitively upon the operating conditions. The conductivities of the films were measured by using complex impedance methods. The conductivities obeyed an Arrhenius

law and exhibited a maximum at a Li content which corresponded to a Li/Al ratio of 0.13 (table 128).

E.Caudron, G.Baud, J.P.Besse, M.Jacquet, G.Blondiaux: Solid State Ionics, 1994, 70-71, 629-35

Table 128

Conductivity of Li-Al-O Thin Films

 

Li/Al

573K(S/m)

Q(eV)

0.05

7.0 x 10-5

0.93

0.07

1.9 x 10-4

0.83

0.10

4.4 x 10-4

0.79

0.13

1.2 x 10-3

0.76

0.18

1.1 x 10-4

0.91

0.23

5.0 x 10-5

0.95