It was noted that electrical failure could be attributed to the occurrence of dislocations in proximity to the trenches of certain electronic devices. Experiments revealed the factors which affected the formation of these so-called trench-induced dislocations. It was found that dry trench etching and subsequent oxidation, rather than ion implantation, were the main causes.

Dislocation Formation Model. M.Dellith, G.R.Booker, B.O.Kolbesen, W.Bergholz, F.Gelsdorf: Journal of the Electrochemical Society, 1996, 143[1], 210-5