It was noted that complex metallic alloys were a group of materials that had giant unit cells and a high density of point defects. Among these was hexagonal Al4Cr, containing 574 atoms, which could also be alloyed with Fe to form Al4(Cr,Fe). One possibility for depositing such thin films was the sequential deposition of the constituent elements and subsequent heat-treatment to homogenize the depth profile. Thus, bi- and tri-layers were deposited in a triode sputtering apparatus. Heat treatment was performed in vacuum at 300 to 600C, for annealing times of up to 5h. The evolution of the depth profiles was evaluated by using Auger electron spectroscopy. It was also observed by using indirect methods such as X-ray diffraction, nano-indentation and electrical resistivity measurements. A major change in the depth profile was accompanied by a change in nanohardness and in electrical resistivity.

Diffusion Processes during Heat Treatment of Al-Cr-Fe Thin Films. P.Panjan, M.Čekada, J.Dolinšek, B.Vrtič, A.Zalar, D.Kek-Merl: Vacuum, 2007, 82[2], 286-9