The Ni self-diffusion coefficient in Si–Ni melts was measured (table 7), for compositions up to 20at%Ni, from 270K below to 200K above the liquidus temperature using quasi-elastic neutron scattering and electromagnetic levitation. The Ni self-diffusion coefficients were of the order of 10-8m2/s and essentially independent of the Ni concentration. The diffusion coefficients, calculated from viscosity data on pure liquid Si via the Stokes–Einstein relationship, compared well with the Ni self-diffusion obtained here. This indicated a strong correlation between the mobility of the Si and Ni atoms.

Nickel Self-Diffusion in Silicon-Rich Si–Ni Melts. A.I.Pommrich, A.Meyer, D.Holland-Moritz, T.Unruh: Applied Physics Letters, 2008, 92[24], 241922

Table 8

Diffusion of Cu in SiC