During the reaction in Ni3Si/Zn ternary diffusion couples at between 390 and 450C, the formation of a periodic layered structure was observed. The periodic layered structure was determined by using scanning electron microscopy coupled with energy dispersive X-ray spectroscopy and X-ray diffraction. It consisted of parallel alternating layers: a ternary phase T (Ni2Zn3Si) layer and the γ (NiZn3) phase layer. A model describing the formation of such a layered structure in the Ni3Si/Zn system was presented.

Periodic Layered Structure in Ni3Si/Zn Diffusion Couples. M.He, X.Su, F.Yin, J.Wang, Z.Li: Scripta Materialia, 2008, 59[4], 411-3