Using direct current-magnetron sputtering, He-trapped Ti films with a He/Ar mixture was studied. The relative helium content, helium depth profiles for the Ti films and crystallization capacity were analyzed by enhanced proton back-scattering spectrometry and X-ray diffraction. It was found that helium diffusion was enhanced with more helium trapping in the Ti films, and the He holding ratios were 95.9, 94.9, 93.9 and 82.8% when the Ti films with the He/Ti of concentrations of 9.7, 19.5, 19.7 and 48.3at% respectively were measured 4 months later,. The diffraction peaks became weak and wider, the peak of (002) plane was shifted to smaller diffraction angles and the relevant interplanar spacing d(hkl) increased gradually with more helium trapping into Ti films. The main peak tending to the (101) plane with both higher deposition temperature and more helium trapping.

Effects of Helium on Titanium Films and the Helium Diffusion. Y.M.Song, S.Z.Luo, X.G.Long, Z.An, N.Liu, H.C.Pang, X.C.Wu, B.F.Yang, S.X.Zheng: Chinese Science Bulletin, 2008, 53[3], 469-72