The diffusion of 15N in α-Ti was studied at 673 to 1023K by using the ion implantation and nuclear resonance techniques. The measurements showed that the diffusion coefficients obeyed:

D(m2/s) = 1.1 x 10-7 exp[-183(kJ/mol)/RT]

A comparison with previous results was also made.

Diffusion Study of 15N Implanted into α-Ti using the Nuclear Resonance Technique. F.L.Bregolin, M.Behar, F.Dyment: Applied Physics A, 2008, 90[2], 347-9