The MM2 molecular mechanics method was used for calculations of the adsorption complex formed on the surface of silicon dioxide due to adsorption of gases such as H2O, O2, NH3, HF. The results of modelling were in good agreement with experimental data; these results explain why film thickness decreases after adsorption and support the hypothesis concerning reconstruction of the surface layer stimulated by the adsorbed molecule.

Silicon Dioxide Surface Reconstruction Stimulated by Adsorption Interaction. F.N.Dultsev: Journal of Structural Chemistry, 2007, 48[2], 231-5