The hydrogen termination and surface reconstruction of (100) silicon annealed at high temperatures in a H2 atmosphere at 1bar was investigated with multiple internal reflection infra-red spectroscopy and atomic force microscopy. The surface flattens and becomes 2 x 1 reconstructed and terminated by strained monohydrides. This surface was shown to be very stable against contamination and oxidation. Surface Reconstruction of Hydrogen Annealed (100) Silicon. H.Bender, S.Verhaverbeke, M.Caymax, O.Vatel, M.M.Heyns: Journal of Applied Physics, 1994, 75[2], 1207