Thermal desorption and Rutherford back-scattering spectrometric studies were made of Ar-implanted samples. Thermal desorption spectra were obtained for implantation doses which ranged from 1013 to 1017/cm2, at energies of between 20 and 60keV. The thermal desorption measurements showed that Ar ions were released from specimens in 2 stages, between 800 and 1100K, thus revealing that the implanted Ar ions were present in 2 different states. The temperatures of these stages were measured as functions of the implantation dose and energy, and it was concluded that a solute Ar ion was released at temperatures of between 800 and 1000K, depending upon the implantation energy, and that agglomerates formed at 1100K. The activation energy for Ar diffusion was estimated to be equal to 1.47eV.

R.Hanada, S.Saito, S.Nagata, S.Yamaguchi, T.Shinozuka, M.Fujioka: Materials Science Forum, 1995, 196-201, 1375-80