A study was made of hydrogen stability and of its evolution during thermal annealing in nanostructured amorphous silicon thin films. From simultaneous measurements of heat and hydrogen desorption, experimental evidence was obtained for molecular diffusion in these materials. A simple diffusion model was proposed which gave good agreement with the experimental data.

Molecular Hydrogen Diffusion in Nanostructured Amorphous Silicon Thin Films. F.Kail, J.Farjas, P.Roura: Physical Review B, 2009, 80[7], 073202