The diffusion of 63Ni in single crystals was studied using the radioactive surface decrease method at between 450 and 800C. The results could be described by:

D(cm2/s) = 1 x 103exp[-4.24(eV)/kT]

The data supported the dissociative diffusion mechanism for Ni diffusion. Rapid interstitial diffusion of Ni was followed by complex reactions of interstitials with vacancies which resulted in the particular concentration profiles of substitutional Ni. It was estimated that the activation energy for the diffusion of vacancies was 1.91eV.

H.P.Bonzel: Physica Status Solidi, 1967, 20[2], 493-504