The dissolution of 3–5 Si ML on Ni was studied using in situ ultra-high vacuum Auger electron spectroscopy (AES). The AES signal shows delays and kinetic changes in the dissolution process. These observations, combined with atomistic kinetic Monte Carlo simulations, considering a face-centered cubic Ni–Si non-regular solid solution, show that the AES signal should correspond to a successive apparition of the Ni-silicides present in the Ni–Si phase diagram at low temperatures, starting with the Si-richer phase.

Subnanometric Si Film Reactive Diffusion on Ni. A.Portavoce, B.Lalmi, G.Tréglia, C.Girardeaux, D.Mangelinck, B.Aufray, J.Bernardini: Applied Physics Letters, 2009, 95[2], 023111