The stress and displacement fields due to an edge dislocation in a linearly elastic, isotropic film-substrate were derived using the method of image dislocations. The key features of the developed method were (1) a decomposition scheme in which the interfacial conditions were satisfied a priori, (2) all singular integrals were eliminated from the governing equations, (3) the elastic fields were obtained in the form of series, the terms of which could be exactly evaluated via integral transforms, and (4) the solutions converge satisfactorily with only three terms of the series. It was shown that the film thickness and dislocation position had a significant influence on the image force acting on the dislocation, and that the film thickness variation due to an accumulation of dislocations may degrade the performance of optical films.

Elastic Fields Due to an Edge Dislocation in an Isotropic Film-Substrate by the Image Method. K.Zhou, M.S.Wu: Acta Mechanica, 2010, 211[3-4], 271-92