An interdiffusivity model was established for SiGe interdiffusion under tensile or relaxed strain over the full Ge content (xGe) range (0 ≤ xGe ≤ 1), which was based on the correlations between self-diffusivity, intrinsic diffusivity, and interdiffusivity. It unifies available interdiffusivity models over the full Ge range and applied to a wider temperature range up to 1270C at the xGe = 0 end and to 900C at the high xGe = 1 end. Interdiffusion experiments under soak and spike rapid thermal annealing conditions were conducted to verify the model. Literature interdiffusion data under furnace annealing conditions were also used for the same purpose. The interdiffusivity model of this work was implemented in major process simulation tools, and the simulation results showed good agreement with experimental data under furnace annealing and soak and spike rapid thermal annealing conditions. This work demonstrated a new approach in studying SiGe interdiffusion, which had the advantage of studying interdiffusion under non-isothermal annealing conditions.

A Unified Interdiffusivity Model and Model Verification for Tensile and Relaxed SiGe Interdiffusion over the Full Germanium Content Range. Y.Dong, Y.Lin, S.Li, S.McCoy, G.Xia: Journal of Applied Physics, 2012, 111[4], 044909