Results were presented for the homo-epitaxial deposition of 20ML onto Pd(001) and Cu(001) near 0K via low energy deposition of 5- and 10-atom clusters, along with preliminary results for deposition of 100-atom clusters. Thin films grown via low energy cluster deposition were found to be more three-dimensional than films grown via single atom deposition. The increased surface roughness could be attributed to two factors: most deposition events added atoms to two or more layers, and the growth of (111) facets on the surface produced many partially exposed atoms. Neither of these features was observed during the deposition of single atoms. Thin films grown by the deposition of larger clusters tended to be rougher than those produced by smaller clusters at this low temperature.Molecular Dynamics Simulation of Low Energy Cluster Deposition During Diffusion-Limited Thin Film Growth. Kelchner, C.L., DePristo, A.E.: Nanostructured Materials, 1997, 8[3], 253-68