Chemical diffusion in TiO2-x within the n-p transition regime was studied. In this regime, several point defects such as oxygen vacancies, titanium interstitials, electrons and electron holes were present in comparable concentrations. Based upon the defect structure in TiO2-x the relationship between chemical diffusion coefficient and self-diffusion coefficients of both titanium and oxygen were deduced

Chemical Diffusion in TiO2. Radecka, M., Rekas, M.: Defect and Diffusion Forum, 2005, 237-240[1], 468-73