The rapid thermal diffusion of In into Hg0.70Cd0.30 was investigated by monitoring In concentration profiles using secondary ion mass spectrometry. It was found that there were 2 diffusing components. One was an atomic diffusion component which could be fitted by a complementary error function, and the other was a fast diffusion component with an exponential dependence. The rapid thermal diffusion of In into Hg0.70Cd0.30, at temperatures of between 100 and 200C (figure 9), could be described by:
D (cm2/s) = 1.45 x 10-2 exp[-0.772(eV)/kT]
Rapid Thermal Diffusion of Indium in p-HgCdTe/CdTe. S.M.Park, J.M.Kim, H.C.Lee, C.K.Kim: Japanese Journal of Applied Physics, 1996, 35[2-12A], L1554-7
Table 17
Diffusivity of Sn in Ge
Temperature (C) | Method | D (cm2/s) |
930 | gas phase | 2.22 x 10-11 |
900 | gas phase | 8.92 x 10-12 |
875 | gas phase | 3.73 x 10-12 |
850 | gas phase | 1.89 x 10-12 |
825 | gas phase | 8.32 x 10-13 |
800 | gas phase | 4.28 x 10-13 |
775 | gas phase | 1.71 x 10-13 |
750 | gas phase | 6.92 x 10-14 |
725 | gas phase | 1.95 x 10-14 |
700 | gas phase | 1.33 x 10-14 |
650 | gas phase | 1.57 x 10-15 |
615 | gas phase | 2.72 x 10-16 |
555 | gas phase | 1.19 x 10-17 |
900 | thin film | 7.84 x 10-12 |
750 | thin film | 6.57 x 10-14 |
700 | thin film | 1.12 x 10-14 |