The atomic motion of O in a c-axis oriented film was studied by using implanted 18O as a tracer. Conventional annealing (1h, 175 to 550C) was performed in a flowing O ambient. Secondary ion mass spectroscopic analysis showed that the implanted isotope began to migrate within the oxide film at temperatures of between 250 and 300C. The results of gas/solid O isotopic exchange showed that, at 315C, the O could enter the oxide film. This confirmed a high mobility of O within the film, even at this low temperature. The apparent volume diffusivity of the O at 315C was found to be about 1.5 x 10-13cm2/s. Short-circuit diffusion was suggested to play an important role in determining the high mobility of O in the c-axis oriented film.

Secondary Ion Mass Spectroscopy Study of Oxygen Tracer Diffusion in a c-Axis-Oriented YBa2Cu3O7-δ Film. Y.Li, J.A.Kilner, T.J.Tate, M.J.Lee, R.J.Chater, H.Fox, R.A.De Souza, P.G.Quincey: Physical Review B, 1995, 51[13], 8498-502

 

Table 61

Diffusion of 64Cu in Polycrystalline Cu3Ba2YO7

Temperature (C)

PO2 (kPa)

D (cm2/s)

950

100

6.3 x 10-11

946

100

5.5 x 10-11

896

100

1.2 x 10-11

850

100

6.1 x 10-12

850

10

6.5 x 10-12

850

1

1.5 x 10-11

805

10

4.4 x 10-12