Thin films were prepared at high temperatures by electron beam deposition in vacuum and were stabilized by annealing at 1100K for 1h. Their electron emission characteristics were investigated by using the thermionic emission method. The work functions of films fabricated at 300, 750 and 1000K had values of 2.7 to 2.8eV. The work functions of films formed on tilted substrates (45° and 80° to the normal direction) at 750K were also measured, and they had values of ∼2.7eV. X-ray diffraction peak positions showed that the stress in the films changed from tensile to compressive with increasing substrate tilt angle and, at 45°, it was nearly zero. It was found that the substrate temperature and film strain had little influence upon the work function.

Work Functions of Thin LaB6 Films. Yutani, A., Kobayashi, A., Kinbara, A.: Applied Surface Science, 1993, 70-71[2], 737-41