A study was made of the H release which occurred, during the annealing of quenched H-containing zone-melted Ni, by using electrical resistivity measurements. At 270K, the results could be interpreted in terms of H volume diffusion in Ni; with a coefficient of 1.9 x 10-10cm2/s. At temperatures ranging from 300 to 370K, the diffusivity could be described by:

D (cm2/s) = 3.5 x 10-3 exp[-0.44(eV)/kT]

S.Scherrer, G.Lozes, B.Deviot: Comptes Rendus, 1967, 264[22], 1499-502