An electrochemical double-cell method was used to measure the diffusion constants and chemical potentials of H in amorphous Ni1-xNbx compounds, where x was equal to 0.20, 0.26, 0.34, 0.41, 0.54 or 0.62. It was noted that Ni-Nb had a smaller binding energy for H than did the similar Ni-Zr combination, and it was therefore possible to probe the Nb4 sites rather than the 3Zr-Ni sites, which were studied in the latter system. By using a Gaussian distribution of H binding energies for the 4Nb sites, a mean binding which was equal to -100MeV was found, with a half-width of 100MeV. The H diffusion coefficient depended upon the alloy composition and the H concentration, and was between 10-15 and 10-12m2/s.

Y.Zhao, D.H.Ryan, J.O.Ström-Olsen, Y.Huai, R.W.Cochrane: Zeitschrift für Physikalische Chemie, 1994, 183[1-2], 59-64