The diffusivity of H in α-phase films was measured, at temperatures of between 278 and 323K, by using an electrochemical stripping method. The films were deposited onto Fe substrates by means of radio-frequency sputtering. The diffusion coefficients which were found for 0.00068 and 0.00136mm films were some 2 orders of magnitude lower than the values reported for bulk specimens. The results could be described by the expression:

D (m2/s) = 4.16 x 10-9exp[-25.7(kJ/mol)/RT]

Diffusion Coefficient of Hydrogen in Palladium Films Prepared by RF Sputtering. H.Hagi: Journal of the Japan Institute of Metals, 1989, 53[11], 1085-8. See also: Materials Transactions, 1990, 31[11], 954-8

 

Table 129

Diffusivity of H through Pd Membranes

with Various Surface Treatments

 

H/Pd

Temperature (K)

Treatment

D (cm2/s)

0.015

423

oxidized, 122

6.14 x 10-6

0.020

423

oxidized, 122μ

6.08 x 10-6

0.020

423

palladized, 104μ

6.11 x 10-6

0.020

423

polished, 119μ

5.24 x 10-6

0.025

423

oxidized, 122μ

6.03 x 10-6

0.025

423

palladized, 104μ

6.10 x 10-6

0.025

423

polished, 119μ

5.28 x 10-6

0.030

423

oxidized, 122μ

5.96 x 10-6

0.030

423

palladized, 104μ

5.95 x 10-6

0.030

423

polished, 119μ

5.15 x 10-6

0.035

423

oxidized, 122μ

5.69 x 10-6

0.035

423

palladized, 104μ

5.72 x 10-6

0.035

423

polished, 119μ

4.91 x 10-6

0.040

423

oxidized, 122μ

5.49 x 10-6

0.040

423

palladized, 104μ

5.54 x 10-6

0.040

423

polished, 119μ

4.85 x 10-6

0.045

423

oxidized, 122μ

5.33 x 10-6

0.010

473

oxidized, 122μ

1.31 x 10-5

0.015

473

oxidized, 122μ

1.28 x 10-5

continued

 

Table 129 (continued)

Diffusivity of H through Pd Membranes

with Various Surface Treatments

 

H/Pd

Temperature (K)

Treatment

D (cm2/s)

0.015

473

palladized, 104μ

1.34 x 10-5

0.015

473

polished, 119μ

1.15 x 10-5

0.020

473

oxidized, 122μ

1.28 x 10-5

0.020

473

palladized, 104μ

1.33 x 10-5

0.020

473

polished, 119μ

1.15 x 10-5

0.025

473

oxidized, 122μ

1.26 x 10-5

0.025

473

palladized, 104μ

1.33 x 10-5

0.025

473

polished, 119μ

1.13 x 10-5

0.010

523

oxidized, 122μ

2.29 x 10-5

0.010

523

palladized, 104μ

2.35 x 10-5

0.010

523

polished, 119μ

2.06 x 10-5

0.015

523

oxidized, 122μ

2.29 x 10-5

0.015

523

palladized, 104μ

2.34 x 10-5

0.015

523

polished, 119μ

2.05 x 10-5

0.020

523

oxidized, 122μ

2.29 x 10-5

0.020

523

palladized, 104μ

2.32 x 10-5

0.020

523

polished, 119μ

2.05 x 10-5

0.025

523

oxidized, 122μ

2.29 x 10-5

0.025

523

palladized, 104μ

2.32 x 10-5

0.025

523

polished, 119μ

2.03 x 10-5