Electrochemical deposition of aluminum and manganese from basic and acidic molten AlCl3-NaCl-KCl onto an aluminum electrode at 180C was studied using voltammetry, and potential and current transient methods. The deposition of aluminum was found to proceed via a nucleation/growth mechanism in basic melts, while the deposition of manganese was found to be diffusion-controlled in basic melts. The diffusion coefficient (2 x 10-6cm2/s) of Mn2+ ions in basic melts, as deduced using voltammetry, was in agreement with the deductions of transient methods. Analysis of the chronoamperograms indicated that the deposition of manganese on Al was controlled by 3D diffusion-controlled nucleation and growth. The processes were manifested as peaks on a decaying chronoamperogram.

Electrodeposition of Al, Mn, and Al-Mn Alloy on Aluminum Electrodes from Molten Salt (AlCl3-NaCl-KCl). M.Jafarian, A.Maleki, I.Danaee, F.Gobal, M.G.Mahjani: Journal of Applied Electrochemistry, 2009, 39[8], 1297-303