Electrochemical deposition of Al and Pb from basic molten AlCl3-NaCl-KCl mixtures onto an aluminum electrode at 180C was studied using voltammetry, potential and current transient and constant current deposition. The deposition of Al was found to proceed via a nucleation/growth mechanism, while the deposition of Pb was diffusion-controlled. The diffusion coefficient calculated for Pb2+ ions in basic melts by voltammetry was in agreement with the deductions of transient methods, and was equal to 8 x 10-6cm2/s. Analysis of the chronoamperograms indicated that the deposition of Pb onto Al substrates was controlled by 3D diffusion control, nucleation and growth. The processes were manifested as peaks on a decaying chronoamperogram.
Electrocrystallization of Pb and Pb Assisted Al on Aluminum Electrode from Molten Salt (AlCl3-NaCl-KCl). M.Jafarian, I.Danaee, A.Maleki, F.Gobal, M.G.Mahjani: Journal of Alloys and Compounds, 2009, 478[1-2], 83-8
Table 49
Diffusivity of Co2+ Ions in CsCl Melts
CoCl2 (/cm3) | Temperature (C) | D (cm2/s) |
1.420 x 105 | 700 | 0.77 x 10-5 |
1.670 x 105 | 700 | 0.73 x 10-5 |
1.761 x 105 | 700 | 1.66 x 10-5 |
1.365 x 105 | 806 | 1.02 x 10-5 |
1.395 x 105 | 806 | 1.75 x 10-5 |
1.480 x 105 | 806 | 2.01 x 10-5 |