The diffusion of 59Fe in the amorphous metal was studied at 533 to 643K. Depth profiling of the as-implanted or diffusion-broadened profiles was carried out by using serial sectioning ion beam sputtering techniques. It was found that the diffusivities between the above temperatures ranged from 3.6 x 10-24 to 1.2 x 10-20m2/s. In as-quenched specimens, the diffusivity increased markedly, with increasing diffusion time, to an almost constant value. The results could be described by

D (cm2/s) = 2.70 x 102 exp[-2.4(eV)/kT]

J.Horvath, H.Mehrer: Crystal Lattice Defects and Amorphous Materials, 1986, 13[1], 1-14