The diffusion coefficients were measured at 489 to 774K. The 16O was injected by ion implantation. The diffusion penetration profiles were then measured by exploiting the 16O(d,p)17*O nuclear reaction. The temperature dependence of the O diffusivity in V-3Ti-2at%Si was described by:

D(m2/s) = 9.0 x 10-5 exp[-163.6(kJ/mol)/RT]

H.Nakajima, S.Nagata, H.Matsui, S.Yamaguchi: Philosophical Magazine A, 1993, 67[3], 557-71