Thin Pt-Al films were prepared via electron beam physical vapour deposition with an atomic concentration ratio of Pt25Al75. These films were heat-treated at 150 to 650C for annealing times of 4 to 60 minutes. The resulting microstructure of the thin films were obtained via secondary electron imaging used in conjunction with depth profiling with the aid of scanning Auger microscopy. Elemental maps of the micrographs were obtained. Simulations, based on a chemical potential Monte Carlo method, were run for various interaction parameters. From these simulations theoretical depth-profiles and proposed microstructures were obtained. These were compared to the experimentally measured depth profiles and elemental maps.

Monte Carlo Simulation of Pt-Al Thin Film Diffusion. R.A.Harris, J.J.Terblans, H.C.Swart, E.Van Der Lingen: Journal of the Southern African Institute of Mining and Metallurgy, 2011, 111[3], 187-91