The diffusivity of H in α-phase films was measured at 278 to 323K by using an electrochemical stripping method. The films were deposited onto Fe substrates by means of radio-frequency sputtering. The diffusion coefficients which were found for 0.00068 and 0.00136mm films were some 2 orders of magnitude lower than the values which were reported for bulk specimens. The data could be described by:

D (cm2/s) = 4.16 x 10-5 exp[-6.1(kcal/mol)/RT]

H.Hagi: Journal of the Japan Institute of Metals, 1989, 53[11], 1085-8