A method was proposed for measuring the diffusion coefficients of water in electron cyclotron resonance plasma chemical vapor deposited material. The coefficients were deduced from the temperature programmed desorption spectra of water, measured in a SiO2/spin-on-glass/Si system. Here, the spun-on glass film was used as a water source. The diffusivity at 400C was equal to 2.3 x 10-52/s, and that at 450C was equal to 7.5 x 10-52/s. Overall, the results could be described by:

D (2/s) = 700 [-1.0(eV)/kT]

The water diffusion coefficients which were measured by using this method indicated a high water-blocking power, as compared with fused silica.

Y.Takahashi, H.Namatsu, K.Machida, K.Minegishi: Japanese Journal of Applied Physics - 2, 1993, 32[3B], L431-3