A Pt/SnOx film with layer thicknesses of 0.88nm (Pt) and 2.65nm (SnOx) was prepared by sequential sputtering onto a glass substrate at temperatures below 90C. The film was then annealed at 500C in air. Changes in the X-ray diffraction pattern were monitored and from these it was deduced that the interdiffusion coefficient was equal to 9 x 10-22cm2/s at 500C.

T.Suzuki, T.Yamazaki, T.Yokoi: Journal of Materials Science Letters, 1988, 7[6], 669-70