Sputtered oxyfluoride films were electrochemically intercalated with Li ions. It was found that the process was thermally activated, with an activation energy that depended upon the amount of intercalated Li and which decreased with increasing Li content. The chemical diffusion coefficient was also thermally activated, with an activation energy of about 0.5eV; regardless of the amount of intercalated Li. The need for the activation energy was explained in terms of the Anderson-Stuart model. It was thought to be likely that strain energy was required in order to open up doorways, in the oxyfluoride structure, so as to permit Li ion transport. The jump length for Li ions within the oxyfluoride was estimated to be between 0.4 and 0.8nm.

M.S.Mattsson, G.A.Niklasson, C.G.Granqvist: Journal of Applied Physics, 1996, 80[4], 2169-74