A double-cell electrochemical technique was used to study H permeation in amorphous alloys. The H diffusivity versus H-content relationships were determined for various alloys (table 29). In each alloy, the H diffusivity increased markedly with increasing H concentration. This implied that there existed a broad range of energy states for H incorporation in the amorphous material. A key experimental feature was the sputter-deposition of a thin passivating surface film immediately after the sputter-deposition of Cu-Ti films.

Y.S.Lee, D.A.Stevenson: Journal of Non-Crystalline Solids, 1985, 72[2-3], 249-66

 

 

 

Table 29

Parameters for H Diffusion in Cu-Ti Amorphous Alloys

 

Material

H/M

Do (cm2/s)

E (kcal/mol)

Cu48Ti52

0.13

9990

18.6

Cu48Ti52

0.22

185

15.6

Cu48Ti52

0.28

0.78

14.8

Cu48Ti52

0.36

0.22

13.6