A double-cell electrochemical technique was used to study H permeation in amorphous alloys. The H diffusivity versus H-content relationships were determined for various alloys (table 29). In each alloy, the H diffusivity increased markedly with increasing H concentration. This implied that there existed a broad range of energy states for H incorporation in the amorphous material. A key experimental feature was the sputter-deposition of a thin passivating surface film immediately after the sputter-deposition of Cu-Ti films.
Y.S.Lee, D.A.Stevenson: Journal of Non-Crystalline Solids, 1985, 72[2-3], 249-66
Table 29
Parameters for H Diffusion in Cu-Ti Amorphous Alloys
Material | H/M | Do (cm2/s) | E (kcal/mol) |
Cu48Ti52 | 0.13 | 9990 | 18.6 |
Cu48Ti52 | 0.22 | 185 | 15.6 |
Cu48Ti52 | 0.28 | 0.78 | 14.8 |
Cu48Ti52 | 0.36 | 0.22 | 13.6 |