Diffusion in Silicon
This volume presents a thorough treatment of the subject, covering a full decade of progress in the understanding of Diffusion in Silicon.
In the first part, thirteen in-depth reviews provide the reader with a concentrated yet comprehensive update on all of the most important subject areas. The second part consists of a 300-page compilation of extended abstracts, which are organized, analyzed and arranged in a readily accessible form. For example, each diffusant has its own section which begins with a graphical summary of the diffusion data for that solute, which have been reported during the past decade. These data are also given in tabulated form.
This volume is a must for any library whose users have an interest in the field!
Section 1: Original and Review Papers. Section 2: Abstracts of Papers on Experiment and Theory.