Diffusion in Materials DIMAT2000

Volumes 194-199

doi: 10.4028/www.scientific.net/DDF.194-199

Diffusion in Materials DIMAT2000

Description:

This book covers, on close to 2000 pages, all aspects of basic and applied diffusion research in all important engineering materials, including metals and intermetallics, elemental and compound semiconductors, amorphous and nanocrystalline materials and oxides.
Volume is indexed by Thomson Reuters CPCI-S (WoS)

Keywords:
Emphasis is placed on applied research, e.g. hydrogen in metals, oxidation and corrosion, reactive diffusion, phase transformations, surface diffusion, stresses in multilayers and device technology.

Chapters : I. Basics in diffusion: solvent and solute diffusion II. Basics in diffusion: chemical diffusion and phenomenology III. Ab initio methods in diffusion IV. Intermetallics: defects and atomic mechanisms V. Intermetallics: tracer diffusion VI. Intermetallics: chemical diffusion and phenomenology VII. Semiconductors: elemental and devices VIII. Semiconductors: compounds IX. Metallic amorphous quasi-crystalline and liquid systems X. Non-metallic amorphous and liquid systems XI. Oxides XII. Hydrogen in metals XIII. Diffusion in grain-boundaries XIV. Wetting at grain boundaries and surfaces XV. Surface diffusion XVI. Stresses multilayers and driven systems XVII. Reactive diffusion XVIII. Oxidation and corrosion XIX. Diffusion and phase transformations XX. Teaching diffusion XXI. Concluding remarks

Info:

ISBN-13:
978-3-908450-60-3
Editors:
Y. Limoge and J.L. Bocquet
Pages:
1940
Year:
2001
Edition:
hardcover

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