Diffusion of Ga Implanted into α-Ti Studied by Means of the Rutherford Backscattering Technique

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Periodical:

Defect and Diffusion Forum (Volumes 213-215)

Edited by:

D.J. Fisher

Pages:

1-18

DOI:

10.4028/www.scientific.net/DDF.213-215.1

Citation:

M. Behar et al., "Diffusion of Ga Implanted into α-Ti Studied by Means of the Rutherford Backscattering Technique ", Defect and Diffusion Forum, Vols. 213-215, pp. 1-18, 2003

Online since:

March 2003

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