Current-Voltage Measurements on Indium Phosphide Schottky Diodes


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In this paper, current-voltage (i-Vg) results from different kinds of n-type InP Schottky diodes are reported. The diodes were fabricated on an unintentionally doped n-type (100) indium phosphide substrate, and the i-Vg characteristics were measured in the temperature range 100 300 K. For the ideality factor, n always exhibited a small (1) but continuous increase with the voltage. At higher forward voltage, slightly higher values of n were due to series resistance effect; in other words, the interface state density always remained small. However, it was possible to obtain some information in the case of discrete interface traps. It was shown that i-Vg measurements can be used as a fast method to determine the densities of the interface states when they equilibrate with the semiconductor.



Defect and Diffusion Forum (Volumes 283-286)

Edited by:

Prof. Andreas Öchsner, Prof. Graeme E. Murch and Ali Shokuhfar




C. A.C. Sequeira and D. M.F. Santos, "Current-Voltage Measurements on Indium Phosphide Schottky Diodes", Defect and Diffusion Forum, Vols. 283-286, pp. 577-582, 2009

Online since:

March 2009




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