Hydrogen Absorption in Ion Beam Sputtered Titanium Thin Films
Titanium films were prepared on sapphire substrates in an UHV chamber, by means of ion beam sputter deposition under Ar-atmosphere at the pressure of 1.5ּ10-4 mbar, with a deposition rate of 2,1 nm/min. The crystal structure was investigated by means of X-Ray diffraction using a Phillips X-Pert diffractometer with a Co-Kα radiation. For electrochemical hydrogen loading, the films were covered by a 30 nm thick layer of Pd in order to prevent oxidation and facilitate hydrogen absorption. The samples were step-by-step loaded with hydrogen by electrochemical charging, which was carried out in a mixed electrolyte of phosphoric acid and glycerine (1:2 in volume). An Ag/AgCl (sat.) and Pt wires were used as the reference and the counter electrode, respectively. XRD measurements were performed before and after hydrogenation in order to investigate the effect of hydrogen loading on the microstructure. The main characteristics of hydrogen's absorption behaviour, as well as the thermodynamics and phase boundaries of titanium-hydrogen thin films are discussed in detail with specific emphasis on the comparison to titanium-hydrogen bulk system.
Andreas Öchsner, Graeme E. Murch and Ali Shokuhfar
E. Tal-Gutelmacher et al., "Hydrogen Absorption in Ion Beam Sputtered Titanium Thin Films", Defect and Diffusion Forum, Vols. 283-286, pp. 662-668, 2009