Diffusion of Ti, V and Nb in Ni3Al at Elevated Temperatures

Abstract:

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Interdiffusion coefficients of Al replacing elements in Ni-Al-X (X=Ti, V and Nb) were estimated by a series of experiments using diffusion couples of Al rich pseudo-binary systems at three different temperatures of 1423, 1473 and 1523K. In order to obtain interdiffusion coefficients of the pseudo-binary systems, the experimental data was analyzed by the Sauer and Freise method, and also impurity diffusion coefficients of Ti, V and Nb in Ni3Al were estimated by applying the Darken-Manning equation. The magnitude of interdiffusion coefficient decreased in order of V, Ti and Nb at all three temperatures. Impurity diffusion coefficients were described by the expressions: , , . The activation enthalpies obtained from the experimental data confirmed the retardation of Ti, V and Nb diffusion in Ni3Al by the anti-site diffusion mechanism. These results are consistent with our previous work on diffusion of Re and Ru in Ni3Al .

Info:

Periodical:

Defect and Diffusion Forum (Volumes 297-301)

Edited by:

Andreas Öchsner, Graeme E. Murch, Ali Shokuhfar and João M.P.Q. Delgado

Pages:

384-389

DOI:

10.4028/www.scientific.net/DDF.297-301.384

Citation:

H. Fukaya et al., "Diffusion of Ti, V and Nb in Ni3Al at Elevated Temperatures", Defect and Diffusion Forum, Vols. 297-301, pp. 384-389, 2010

Online since:

April 2010

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$35.00

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