Diffusion-Induced Recrystallization in Nickel/Palladium Multilayers

Abstract:

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Diffusion-Induced Recrystallization (DIR) is investigated in size mismatched thin film interdiffusion couples. New grains formed in the diffusion zone are characterized by distinctive composition levels which seem to be characteristic to the interdiffusing materials. In this paper, we analyzed sputter-deposited Ni/Pd films. The lattice mismatch and the driving force are varied by pre-alloying one side of the diffusion couples. Recrystallization was detected after heat treatment by transmission electron microscopy, energy dispersive X-ray spectroscopy and X-ray diffractometry. We determined characteristic concentrations from XRD data. Remarkably, the difference between the concentration inside newly formed grains and that of the parent layers remains practically constant, when initial layer concentration is varied. Also, the characteristic compositions are nearly independent of temperature. A thermo-mechanic model has been derived, which demonstrates that the observed concentration differences are such that the stress in front of the moving grain boundary reaches a maximum close to the ideal strength of the host material.

Info:

Periodical:

Defect and Diffusion Forum (Volumes 309-310)

Edited by:

B.S. Bokstein, A.O. Rodin and B.B. Straumal

Pages:

195-202

DOI:

10.4028/www.scientific.net/DDF.309-310.195

Citation:

G. Schmitz et al., "Diffusion-Induced Recrystallization in Nickel/Palladium Multilayers", Defect and Diffusion Forum, Vols. 309-310, pp. 195-202, 2011

Online since:

March 2011

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$35.00

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