Hydrogen-Induced Superabundant Vacancies in Metals: Implication for Electrodeposition

Abstract:

Article Preview

The equilibrium concentration of vacancies in metals is invariably enhanced in the presence of interstitial hydrogen atoms – a phenomenon called superabundant vacancy (SAV) formation. It has been recognized that the SAV formation occurs in electrodeposition, as M-, H-atoms and M-atom vacancies are deposited by atom-by-atom process. Effects of SAV formation are described for electrodeposited Ni, Ni-Fe alloys, Fe-C alloys and Cu. Possible implication of SAV formation for corrosion in Al and steels is also briefly described.

Info:

Periodical:

Defect and Diffusion Forum (Volumes 312-315)

Edited by:

Prof. Andreas Öchsner, Prof. Graeme E. Murch and Prof. João M.P.Q. Delgado

Pages:

1106-1115

Citation:

Y. Fukai, "Hydrogen-Induced Superabundant Vacancies in Metals: Implication for Electrodeposition", Defect and Diffusion Forum, Vols. 312-315, pp. 1106-1115, 2011

Online since:

April 2011

Authors:

Export:

Price:

$38.00

[1] Y. Fukai and N. Ōkuma: Jpn. J. Appl. Phys. Vol. 32 (1993), p. L1256.

[2] H. Ōsono, T. Kino, Y. Kurokawa, and Y. Fukai: J. Alloys Comp. Vol. 231 (1995), p.41.

[3] D. dos Santos, S.S.M. Tavares, S. Miraglia, D. Fruchart, and D.R. dos Santos: J. Alloys Comp. Vol. 356/357 (2003), p.258.

[4] Y. Fukai and N. Ōkuma: Phys. Rev. Lett. Vol. 73 (1994), p.1640.

[5] D.S. dos Santos, S. Miraglia, and D. Fruchart: J. Alloys Comp. Vol. 291 (1999), p. L1.

[6] Y. Fukai, Y. Shizuku, and Y. Kurokawa: J. Alloys Comp. Vol. 329 (2001), p.195.

[7] Y. Fukai, T. Haraguchi, E. Hayashi, Y. Ishii, Y. Kurokawa, and J. Yanagawa: Defect Diff. Forum Vol. 194-199 (2001), p.1063.

DOI: https://doi.org/10.4028/www.scientific.net/ddf.194-199.1063

[8] D. Kyoi, T. Sato, E. Rönnebro, Y. Tsuji, N. Kitamura, A. Ueda, M. Ito, S. Katsuyama, S. Hara, D. Noréus, and T. Sakai: J. Alloys Comp. Vol. 375 (2004), p.253.

DOI: https://doi.org/10.1016/j.jallcom.2003.11.150

[9] T. Sato, D. Kyoi, E. Rönnebro, N. Kitamura, T. Sakai, and D. Noréus: J. Alloys Comp. Vol. 417 (2006), p.230.

[10] D. Kyoi, N. Kitamura, N. Tanaka, A. Ueda, S. Tanase, and T. Sakai: J. Alloys Comp. Vol. 428 (2007), p.268.

[11] Y. Fukai, M. Yamakata, and T. Yagi: Z. Phys. Chem. Vol. 179 (1993), p.119.

[12] K. Watanabe, N. Ōkuma, Y. Fukai, Y. Sakamoto, and Y. Hayashi: Scripta Mater. Vol. 34 (1996), p.551.

[13] E. Hayashi, Y. Kurokawa, and Y. Fukai: Phys. Rev. Lett. Vol. 80 (1998), p.5588.

[14] H. Koike, H. Shizuku, A. Yazaki, and Y. Fukai: J. Phys.: Condens. Matter Vol. 16 (2004), p.1335.

[15] T. Iida, Y. Yamazaki, T. Iijima, and Y. Fukai: Acta Mater. Vol. 53 (2005), p.3083.

[16] Y. Yamazaki, Y. Iijima, and M. Okada: Acta Mater. Vol. 52 (2004), p.1247.

[17] Y. Fukai: Defect Diff. Forum Vol. 297-301 (2010), p.132.

[18] M.G. Ganchenkova and V.A. Vorodin: Phys. Rev. B Vol. 75 (2007), p.054108.

[19] M.G. Ganchenkova, V.A. Borodin, and R.M. Nieminen: Phys. Rev. B Vol. 79 (2009), p.134101.

[20] L. Ismer, M.S. Park, A. Janotti, and C.G. Van de Walle: Phys. Rev. B Vol. 80 (2009), p.184110.

[21] C. Wolverton, V. Ozoliņš, and M. Asta: Phys. Rev. B Vol. 69 (2004), p.144109.

[22] G. Lu and E. Kaxiras: Phys. Rev. Lett. Vol. 94 (2005), p.155501.

[23] Y. Tateyama and T. Ohno: Phys. Rev. B Vol. 67 (2003), p.174105.

[24] H. Zheng, B.K. Rao, S.N. Khanna, and P. Jena: Phys. Rev. B Vol. 55 (1997), p.4174.

[25] E.K. Hlil, D. Fruchart, S. Miraglia, and J. Tobola: J. Alloys Comp. Vol. 356/357 (2003), p.169.

[26] O. Yu. Vekilova, D.I. Bazhanov, S.I. Simak, and I.A. Abrikosov: Phys. Rev. B Vol. 80 (2009), p.024101.

[27] C. Zhang and Ali Alavi: J. Am. Chem. Soc. Vol. 127 (2005), p.9808.

[28] Y. Fukai and H. Sugimoto: J. Phys.: Condens. Matter Vol. 19 (2007), p.436201.

[29] Y-L. Liu, Y. Zhang, H-B. Zhou, G-H. Lu, F. Liu, and G-N. Luo: Phys. Rev. B Vol. 79 (2009), p.172103.

[30] P.R. Monasterio, T.T. Lau, S. Yip, and K. Van Vliet: Phys. Rev. Lett. Vol. 103 (2009), p.085501.

[31] M. Ji, C-Z. Wang, K-M. Ho, S. Adhikari, and K.R. Hebert: Phys. Rev. B Vol. 81 (2010), p.024105.

[32] Y. Fukai, M. Mizutani, S. Yokota, M. Kanazawa, Y. Miura, and T. Watanabe: J. Alloys Comp. Vol. 356/357 (2003), p.270.

[33] N. Mukaibo, Y. Shimizu, Y. Fukai, and T. Hiroi: Mater. Trans. Vol. 49 (2008), p.2815.

[34] Y. Fukai: Phys. Scr. T Vol. 103 (2003), p.11.

[35] Y. Fukai: J. Alloys Comp. Vol. 356/357 (2003), p.263.

[36] Y. Fukai, The Metal-Hydrogen System, 2nd ed., Springer, Berlin-Heidelberg, 2005, Chapter 5. 6.

[37] N. Fukumuro, T. Kono, T. Maruo, S. Yae, H. Matsuda, and Y. Fukai; to be published.

[38] J.P. Hirth: Metall. Trans. A Vol. 11A (1980), p.861.

[39] D.S. Stoychev, I.V. Tomov, and I.B. Vitanova: J. Appl. Electrochem. Vol. 15 (1985), p.879.

[40] I.V. Tomov, D.S. Stoychev, and I.B. Vitanova: J. Appl. Electrochem. Vol. 15 (1985), p.887.

[41] H. Nawafune, Y. Fukuda, S. Mizumoto, and M. Haga: Hyomen Gijutsu Vol. 46 (1995), p.834.

[42] H. Lee, S.S. Wong, and S.D. Lopatin: J. Appl. Phys. Vol. 93 (2003), p.3796.

[43] V.A. Vas'ko, I. Tabakovic, and S.C. Riemer: Electrochem. Solid-State Lett. Vol. 6 (2003), p. C100.

[44] H. Lee, W.D. Nix, and S.S. Wong: J. Vac. Sci. Technol. B Vol. 22 (2004), p.2369.

[45] V.A. Vas'ko, I. Tabakovic, S.C. Riemer, and M.T. Kief: Microelectron. Eng. Vol. 75 (2004), p.71.

[46] H. Abe, A. Kondo, T. Watanabe: J. Japan Inst. Metals Vol. 68 (2004), p.844.

[47] T.P. Moffat, J.E. Vonevich, W.H. Huber, A. Stanishevsky, D.R. Kelly, G.R. Stafford, and D. Josell: J. Electrochem. Soc. Vol. 147 (2000), p.4524.

[48] T. Osaka, N. Yamachika, M. Yoshino, M. Hasegawa, Y. Negishi, and Y. Okinaka: Electrochem. Solid-State Lett. Vol. 12 (2009), p. D15.

DOI: https://doi.org/10.1149/1.3054273

[49] M. Hasegawa, Y. Nonaka, Y. Negishi, Y. Okinaka, and T. Osaka: J. Electrochem. Soc. Vol. 153 (2006), p. C117.

[50] S. Nakahara, S. Ahmed, and D.N. Buckley: Electrochem. Solid-State Lett. Vol. 10 (2007), p. D17.

[51] T. Adachi, N. Fukumuro, S. Yae, H. Matsuda, and Y. Fukai; to be published.

[52] S. Wakabayashi, K. Iwano, M. Nakazawa, Y. Onuma, N. Kaneko: Hyomen Gijutsu Vol. 51 (2000), p.1021.

[53] T. Fujikawa, T. Yoshikawa, T. Ohnishi, and T. Sato: Jpn J. Appl. Phys. Vol. 40 (2001), p.2191.

[54] K.R. Hebert, H. Wu, T. Gessmann, and K. Lynn: J. Electrochem. Soc. Vol. 148 (2001), p. B92.

[55] K.R. Hebert, T. Gessmann, K. Lynn, and Asoka-Kumar: J. Electrochem. Soc. Vol. 151 (2004), p. B22.

[56] R. Huang, K.R. Hebert, and L.S. Chumbley: J. Electrochem. Soc. Vol. 151 (2004), p. B379.

[57] K. Muthukrishnan, K.R. Hebert, and T. Makino: J. Electrochem. Soc. Vol. 151 (2004), p. B340.

[58] S. Adhikari, J. Lee, and K.R. Hebert: J. Electrochem. Soc. Vol. 155 (2008), p. C16.

[59] S. Adhikari, and K.R. Hebert: J. Electrochem. Soc. Vol. 155 (2008), p. C189.

[60] K. Arioka, T. Miyamoto, T. Yamada, and T. Terachi: Corrosion Vol. 66 (2010), p.015008.

[61] K. Arioka, T. Yamada, T. Terachi, and T. Miyamoto: Corrosion Vol. 64 (2008), p.691.